| 摘要 |
An exposure apparatus and method exposes a substrate via a projection optical system and a liquid. A liquid immersion system supplies liquid to form a liquid immersion region below the projection optical system. First and second tables each can mount a substrate. A drive system drives the first and second tables, which are positionable below the projection optical system. The drive system is controlled to move the first and second tables below the projection optical system relative to the liquid immersion region to replace one of the first and second tables positioned below the projection optical system with the other of the first and second tables such that the liquid immersion region is transferred from the one of the first and second tables to the other of the first and second tables while the liquid immersion region is maintained below and in contact with the projection optical system. |
