发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A semiconductor device includes a first semiconductor layer, a second semiconductor layer, a third semiconductor layer, a first electrode, a second electrode, a control electrode, and a third electrode. The second semiconductor layer is provided on the first semiconductor layer and has a band gap narrower than that of the first semiconductor layer. The second semiconductor layer includes a first portion and a second portion which is provided together with the first portion and contains an activated acceptor. The third semiconductor layer is provided on the first portion and has a band gap wider than or equal to the band gap of the second semiconductor layer. The first and the second electrodes are provided on the third semiconductor layer. The control electrode is provided between the first electrode and the second electrode. The third electrode is provided on the second portion.
申请公布号 US2014117375(A1) 申请公布日期 2014.05.01
申请号 US201314025961 申请日期 2013.09.13
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ISOBE YASUHIRO;MORIZUKA MAYUMI
分类号 H01L29/778;H01L29/66 主分类号 H01L29/778
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