发明名称 Substrate treatment system, substrate treatment method, and non-transitory computer storage medium
摘要 A substrate treatment system includes a plurality of treatment apparatuses, a position adjustment apparatus adjusting a center position of the substrate, a substrate transfer apparatus transferring the substrate to the treatment apparatuses and the position adjustment apparatus, and a control unit controlling operations of the apparatuses. The substrate transfer apparatus includes an arm part curved along a peripheral edge portion of the substrate with a radius of curvature larger than a radius of the substrate, and a holding part projecting inward from the arm part and holding a rear surface of the substrate. The position adjustment apparatus includes a mounting table which holds a central portion of the rear surface of the substrate and is rotatable and horizontally movable. The control unit controls the mounting table such that the center position of the substrate held on the mounting table is aligned with a center position of the arm part.
申请公布号 US8707893(B2) 申请公布日期 2014.04.29
申请号 US201113300114 申请日期 2011.11.18
申请人 DEGUCHI MASATOSHI;FUNAKOSHI HIDEO;TAKEI TOSHICHIKA;SATO NORIFUMI;KIYOTA WATARU;ISHIMARU DAISUKE;MACHIDORI SHINICHI;SUNAKA IKUO;KAMEI SHIGENORI;TOKYO ELECTRON LIMITED 发明人 DEGUCHI MASATOSHI;FUNAKOSHI HIDEO;TAKEI TOSHICHIKA;SATO NORIFUMI;KIYOTA WATARU;ISHIMARU DAISUKE;MACHIDORI SHINICHI;SUNAKA IKUO;KAMEI SHIGENORI
分类号 B05C13/00;B05C13/02;B05C21/00;B65H1/00 主分类号 B05C13/00
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