发明名称 Pattern transfer apparatus and method for fabricating semiconductor device
摘要 A pattern transfer apparatus according to one embodiment includes a transfer region selecting part that performs operation in which when performing pattern transfer from a template provided with N transfer regions (N is an integer of 2 or larger) to a transferring substrate a plurality of times, 1 to N−1 transfer regions, which are to be used to perform the transfer to regions of the transferring substrate corresponding to part of the N transfer regions, are selected such that the number of the transfer to be performed using each of the N transfer regions is evened out.
申请公布号 US8709955(B2) 申请公布日期 2014.04.29
申请号 US201213422942 申请日期 2012.03.16
申请人 KOBAYASHI YUJI;KABUSHIKI KAISHA TOSHIBA 发明人 KOBAYASHI YUJI
分类号 B29C59/02;H01L21/302;H01L21/31 主分类号 B29C59/02
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