The present invention provides a method for forming an organic pattern. The method for forming an organic pattern according to one embodiment of the present invention includes the steps of: forming a donor film and an organic layer on a first substrate; arranging a second substrate so that the second substrate corresponds to the first substrate; and heating the first substrate in order to sublimate a material forming the organic layer so as to form an organic pattern layer on the second substrate, wherein the position on the first substrate where the organic layer is formed corresponds to the position on the second substrate where the organic pattern layer is formed.
申请公布号
WO2014061942(A2)
申请公布日期
2014.04.24
申请号
WO2013KR09091
申请日期
2013.10.11
申请人
J & J CHEMICAL CO.
发明人
LEE, CHUN HYUK;KIM, DONG JUN;AN, HYUN CHEOL;HAM, HO WAN;HAN, JEONG WOO;GIM, GEUN TAE