METHOD FOR MANUFACTURING MASK BLANK AND METHOD FOR MANUFACTURING TRANSFER MASK

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a mask blank and a transfer mask, for obtaining a mask blank and a transfer mask giving little non-uniformity of sensitivity distribution within a plane of a resist film to be formed.SOLUTION: The method for manufacturing a mask blank includes formation of a resist film from a resist material on a substrate; and the formation of the resist film includes a dropping step of dropping a resist solution comprising the resist material and a solvent onto a square substrate. In the dropping step, when a rotational speed of the substrate at time t is denoted by R(t), a rotational speed R(t) of the substrate at a termination time tof dropping the resist solution is from 300 to 2000 rpm.