| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an ink ejection head by which deflection of a thin film due to heat treatment by photolithography method can be suppressed.SOLUTION: There is provided the method for manufacturing an ink ejection head 100 that is formed in a substrate 201 and has a heater, an ink flow passage CH formed on the heater and a nozzle hole 110 communicated with the ink flow passage CH. The method comprises: a flow passage wall formation step S2 of forming a flow passage wall 203 constituting the lateral face of the ink flow passage CH; a thin film sticking step S5 of sticking a thin film 207 on which the nozzle hole 110 is formed to an upper face of the flow passage wall 203; an exposure step S6 of exposing the thin film 207; a heat treatment step S9 of heat-treating the thin film 207; a development step S9 of developing the thin film 207; an adhesion step S4 of closely adhering a support 204 that is thicker than the thin film to the thin film 207 before the heat treatment step S8; and a removal step S8 of removing the support 204 after the heat treatment step S7. |
