发明名称 Chemical installation
摘要 According to the present invention, a chemical installation is provided. The chemical installation comprises A first unit for providing a first aqueous waste stream comprising nitrobenzene; At least a second unit for providing a second aqueous waste stream comprising aniline. The chemical installation comprises an aniline cleaning apparatus for removing nitrobenzene from aniline, and further comprising a stripping column for stripping aniline from an aqueous stream. The first and second aqueous waste stream are provided to the stripping column, stripping aniline and nitrobenzene from the first and the aqueous waste stream, and the stripped aniline and nitrobenzene is provided to the aniline cleaning apparatus.
申请公布号 US8697913(B2) 申请公布日期 2014.04.15
申请号 US201013376632 申请日期 2010.05.21
申请人 ZEEUW AREND-JAN;BENT MARK GEOFFREY;HUNTSMAN INTERNATIONAL LLC 发明人 ZEEUW AREND-JAN;BENT MARK GEOFFREY
分类号 C07C211/00;C07C209/00 主分类号 C07C211/00
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