METHOD OF DEPOSITING ALUMINUM OXIDE

摘要

PROBLEM TO BE SOLVED: To provide a technique for enhancing the deposition rate of aluminum oxide by sputtering.SOLUTION: A method of depositing aluminum oxide includes a first plasma generation step for generating plasma in a vacuum container into which sputter gas and reactive gas are introduced, and a second plasma generation step for generating magnetron plasma by a magnetostatic field, by applying a sputter voltage of negative voltage to an aluminum target. The first plasma generation step is a step for generating high frequency induction coupling plasma during at least the second plasma generation step, by using a high frequency antenna consisting of a conductor provided in a vacuum vessel and having a number of turns less than one lap.