发明名称 HEAT TREATMENT APPARATUS
摘要 According to the embodiment of the present invention, an inactive gas is certainly discharged from a gap between the lag and the cover of a heat treatment to the inner part of a reaction pipe. The heat treatment device (1) includes a reaction pipe (4) having a furnace hole (3) in a low direction, a cover (5) sealing the furnace hole (3) of the reaction pipe (4), a heat treatment boat (16) supported by forming a lag part (18) in the cover (5), and a rotation shaft part (27) connected to the lag part (18) and extended and penetrating the cover (5). The cover (5) has a surround ring (5a) sounding the low flange (19) of the lag part (18). The inactive gas from the inactive gas introduction pipe (51) is supplied between the cover (5) and the rotation shaft part (27). The inactive gas is discharged from the gap (g) between the low flange (19) and the surrounding ring (5a) to the inner part of the reaction pipe (4).
申请公布号 KR20140032905(A) 申请公布日期 2014.03.17
申请号 KR20130106661 申请日期 2013.09.05
申请人 TOKYO ELECTRON LIMITED 发明人 KANEKO HIROFUMI;CHIBA KENICHI
分类号 H01L21/324 主分类号 H01L21/324
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