发明名称 THIN FILM STRUCTURE INCLUDING ORDERED ALLOY AND METHOD FOR MANUFACTURING THE THIN FILM STRUCTURE
摘要 The present invention provides: a thin film structure including an ordered alloy in which atoms are orderly arranged using an inexpensive substrate; and a method for manufacturing the thin film structure. Specifically, the thin film structure includes a substrate, a plating layer formed on the substrate and made of one selected from the group consisting of NiPMo and NiPW, and an ordered alloy disposed on the plating layer. The method for manufacturing the thin film structure includes the steps of: forming a plating layer on a substrate, the plating layer being made of one selected from the group consisting of NiPMo and NiPW; and forming an ordered alloy on the plating layer. The vacuum degree immediately before the ordered alloy is formed is 7.0×10-7 Pa or less. In the step of forming the ordered alloy, a process gas has an impurity concentration of 5 ppb or lower.
申请公布号 US2014072829(A1) 申请公布日期 2014.03.13
申请号 US201313936863 申请日期 2013.07.08
申请人 TOHOKU UNIVERSITY;FUJI ELECTRIC CO., LTD. 发明人 INABA YUKI;SHIMATSU TAKEHITO
分类号 G11B5/62;B81B3/00;C23C28/02;H01L43/10 主分类号 G11B5/62
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