| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for cleaning gas, which can remove fine particles regardless of their size without reducing supply efficiency of the gas. SOLUTION: A loader module 14 in a substrate treating system 10 is provided with a fan filter unit 20 which forms the downflow of atmospheric air in the inside space of a conveyance chamber 15. The fan filter unit 20 is provided with a fan 21 for generating an atmospheric air flow, a filter 22 for catching and removing particles mixed in the atmospheric air flow and an irradiation heater 23 which is arranged between the fan 21 and the filter 22. At least one high temperature section which is located above a gas flow and has temperature higher than that of the filter 22 is formed by irradiating the gas flow with radiation heat from the irradiation heater 23 from a direction orthogonal to a gas flowing direction so that moving force to the filter 22 can be enlarged by applying thermophoretic force to the fine particles mixed in the gas flow. COPYRIGHT: (C)2013,JPO&INPIT |
