<p>According to one embodiment of the present invention, a substrate processing device, where the processing of a substrate takes place, comprises: a main chamber body which has an open topped shape and has a through pathway that is formed on one side thereof and allows the substrate to enter and exit; a chamber lid which is provided on the top part of the main chamber body and closes the open top part of the main chamber body so as to provide a processing space where processing of the substrate takes place; a susceptor which is provided inside the processing space and heats the substrate; and a heating block which is provided on a top part and a bottom part of the through pathway and effects the pre-heating of the substrate which has been loaded via the through pathway.</p>
