| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with excellent line edge roughness can be produced.SOLUTION: The resist composition comprises a resin including a structural unit expressed by formula (I), a resin including a structural unit having an acid-labile group, and an acid generator expressed by formula (II). In the formulae, Rrepresents a hydrogen atom or a methyl group; Arepresents an alkanediyl group; Rrepresents a hydrocarbon group having a fluorine atom; Xrepresents an alkanediyl group which may be substituted with a hydroxy group or -ORand in which a methylene group constituting the alkanediyl group may be replaced by an oxygen atom or a carbonyl group; Rand Reach represent a hydrocarbon group which may be substituted with a fluorine atom or a hydroxy group and in which a methylene group constituting the hydrocarbon group may be replaced by an oxygen atom or a carbonyl group; and Zrepresents an organic cation. |
