| 摘要 |
<p>Provided is a photoresist composition containing a polymer that contains, as a constituent unit, a specific methacrylic acid ester derivative. The photoresist composition can form a photoresist pattern with improved LWR and high resolution. More specifically, provided is an acrylic acid ester derivative represented by the following general formula (1): wherein R1 is a hydrogen atom or a methyl group; and A represents the following general formula (A-1) or (A-2): wherein R2 and R3 are each independently an alkyl group having 1 to 6 carbon atoms or a cyclic hydrocarbon group having 3 to 6 carbon atoms; Z is CH2 or—O—; and n is 0 or 1; with the proviso that in (A-1) there is no case where R2 is a methyl group and Z is CH2 and n is 1.</p> |
