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发明名称
成膜装置及靶装置
摘要
本发明提供一种成膜装置及靶装置,其可提高对基板之成膜的生产率。成膜装置(1)具备作为成膜材料之靶(25)和与该靶(25)接触而进行冷却之板状冷却板(22),靶(25)和冷却板(22)藉由夹具(27)固定,冷却板(22)中,作为与靶(25)对置之面之第1面(22a)的相反侧面即第2面(22b)暴露于压力高于第1面(22a)的气氛中,并且使第1面(22b)之部(22c)向靶(25)侧移位而按压靶(25)。
申请公布号
TWI424079
申请公布日期
2014.01.21
申请号
TW100131119
申请日期
2011.08.30
申请人
住友重机械工业股份有限公司 日本
发明人
岩田宽
分类号
C23C14/34
主分类号
C23C14/34
代理机构
代理人
林志刚 台北市中山区南京东路2段125号7楼
主权项
地址
日本
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