EXPOSURE DEVICE AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To expose a film with a different pattern from two patterns.SOLUTION: An exposure device comprises: a film holding part for holding a film; a mask in which a first pattern and a second pattern separated from the first pattern are formed; and an exposure part for irradiating the mask with a light flux and exposing the film by the light flux having passed the first pattern or the second pattern. The exposure part comprises: a first optical output part for outputting a first light flux irradiating the first pattern; and a second optical output part for outputting a second light flux having a main beam intersecting a main beam of the first light flux outputted from the first optical output part and irradiating the second pattern. The film holding part holds the film at a position closer to the mask than a position at which the first light flux is intersected with the second light flux.