| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a composition for polishing capable of polishing the whole of functional materials with high efficiency and securing excellent polishing characteristics in surface roughness, flatness, shape stability and so on. <P>SOLUTION: This composition for polishing is characterized by having abrasive grain for polishing containing hydrophobilizing abrasive grain to be fine powder processed by being brought into contact with a silazane compound shown by a formula (1) NH(SiMe<SB>3</SB>)<SB>2</SB>. Since the composition has abrasive grain for polishing containing the hydrophobilizing abrasive grain processed by the silazane compound shown by the formula (1), suction force of the abrasive grain on a workpiece and a member for polishing such as a pad to be used for polishing is improved, and a polishing material can be effectively utilized. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
