抛光液及化学机械抛光（ＣＭＰ）方法,申请号TW095139028-传众专利搜索

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发明名称	抛光液及化学机械抛光（ＣＭＰ）方法
摘要
申请公布号	TWI421317	申请公布日期	2014.01.01
申请号	TW095139028	申请日期	2006.10.23
申请人	３Ｍ新设资产公司美国	发明人	杰佛瑞　史考特　可罗吉
分类号	C09G1/06;C09G1/00;B24B7/20;B24B7/22	主分类号	C09G1/06
代理机构		代理人	陈长文台北市松山区敦化北路201号7楼;简秀如台北市松山区敦化北路201号7楼
主权项
地址	美国

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