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发明名称
METHOD FOR FABRICATING METAL THIN FILM ON SEMICONDUCTOR SURFACE USING PVD
摘要
申请公布号
KR100800799(B1)
申请公布日期
2008.02.04
申请号
KR20050131329
申请日期
2005.12.28
申请人
发明人
分类号
H01L21/203
主分类号
H01L21/203
代理机构
代理人
主权项
地址
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