发明名称 |
METHOD FOR MANUFACTURING N-TYPE SILICON SINGLE CRYSTAL, AND PHOSPHORUS-DOPED N-TYPE SILICON SINGLE CRYSTAL |
摘要 |
The present invention is directed to a method for producing an N-type silicon single crystal by the FZ method, wherein the N-type silicon single crystal is produced by performing doping by using Ar-based PH 3 gas and Ar-based B 2 H 6 gas as doping gas. As a result, an N-type silicon single crystal production method and an N-type silicon single crystal, the method that can prevent the generation of OSFs even when a silicon single crystal, in particular, a silicon single crystal with a diameter of 8 inches (200 mm) or more is produced by the FZ method, are provided. |
申请公布号 |
EP2679706(A1) |
申请公布日期 |
2014.01.01 |
申请号 |
EP20110859432 |
申请日期 |
2011.02.23 |
申请人 |
SHIN-ETSU HANDOTAI CO., LTD. |
发明人 |
KODAMA, YOSHIHIRO;SATO, KENICHI;NAKAZAWA, KEIICHI |
分类号 |
C30B13/12;C30B29/06 |
主分类号 |
C30B13/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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