| 摘要 |
PROBLEM TO BE SOLVED: To form a drive circuit having high performance with a good yield, in a display device having a drive circuit formed with TFTs outside a display region. SOLUTION: In a drive part DRV, a metal base film 113 for heat dissipation is formed on a TFT substrate 101 in advance. Thereafter, undercoats such as a silicon nitride film 102 and a silicon oxide film 103 are formed, an a-Si film is formed by a CVD method, and the a-Si film is converted to a polysilicon film by laser anneal. Thereafter, the polysilicon film is converted to a SELAX (Selectively Enlarging Laser Crystallization) film 111 by laser anneal in a different condition. Since the metal base film 113 is formed under the undercoat film, a flaw of the SELAX film 111 caused by gas generated by excessively heating the undercoat film in the laser anneal can be prevented. Thereby, a high-performance drive circuit can be formed with a good yield. COPYRIGHT: (C)2009,JPO&INPIT |
