发明名称 POSITIVE PHOTOSENSITIVE MATERIAL
摘要 The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, -H or -CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a -COOCH2- group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.
申请公布号 US2013337380(A1) 申请公布日期 2013.12.19
申请号 US201213524790 申请日期 2012.06.15
申请人 LIU WEIHONG;LU PINGHUNG;CHEN CHUNWEI;MEYER STEPHEN;TOUKHY MEDHAT;LAI SOOKMEE;AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. 发明人 LIU WEIHONG;LU PINGHUNG;CHEN CHUNWEI;MEYER STEPHEN;TOUKHY MEDHAT;LAI SOOKMEE
分类号 G03F7/004 主分类号 G03F7/004
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