METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a resist composition that can give a resist pattern with a superior focus margin (DOF).SOLUTION: A method for producing a resist pattern includes steps of: (1) applying a following resist composition on a substrate; (2) drying the applied resist composition to form a composition layer; (3) exposing the composition layer; (4) heating the exposed composition layer; and (5) developing the heated composition layer with a negative developing solution. The resist composition comprises: a resin (A1) that has an acid-labile group and is decomposed by an action of an acid to decrease the solubility with a negative developing solution; a resin (A2) that has a fluorine atom and is soluble with a negative developing solution; a compound expressed by formula (I); an acid generator; and a solvent. In the formula, Rand Reach independently represent a hydrocarbon group having 1 to 12 carbon atoms; and m' and n' each independently represent an integer of 0 to 4.