发明名称 Method of manufacturing polishing pad having detection window
摘要 A polishing pad having a detection window and a method of manufacturing the polishing pad are provided. A dummy detection window is pre-disposed in a mold. A polishing layer precursor is filled into the mold, and then a solidifying process is performed to form a polishing layer, wherein the polishing layer and the dummy detection window are separable completely. The polishing layer and the dummy detection window are separated from each other so as to form a detection opening in the polishing layer. The detection opening can alternatively be formed in a mold having a protrusion structure to replace the dummy detection window. A detection window precursor is filled into the detection opening, and then a solidifying process is performed to form a detection window.
申请公布号 US8609001(B2) 申请公布日期 2013.12.17
申请号 US20100795966 申请日期 2010.06.08
申请人 PAI KUN-CHE;LI SHIUAN-TZUNG;WANG CHAO-CHIN;YANG WEI-WEN;IV TECHNOLOGIES CO., LTD. 发明人 PAI KUN-CHE;LI SHIUAN-TZUNG;WANG CHAO-CHIN;YANG WEI-WEN
分类号 B29C39/10;B29C39/12 主分类号 B29C39/10
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