| 摘要 |
PROBLEM TO BE SOLVED: To provide a development processor capable of performing highly accurate feedforward dimension correction and achieving high dimension control accuracy even when there is sensitivity variation on a photosensitive film.SOLUTION: A development processor for developing a photosensitive film on a processed substrate comprises: an acquisition unit 12 which acquires pattern information exposed to the photosensitive film; a calculation unit 31 which calculates a film reduction amount of an exposed unit in a state in which a part of the substrate is developed by half; a prediction unit 32 which calculates a prediction pattern dimension when development processing is performed under standard development conditions on the basis of a film reduction amount and prediction dimension table 35; a calculation unit 33 which calculates a pattern dimension correction amount for correcting the prediction pattern dimension into a desired value; a correction table selection mechanism 37 which selects any of a plurality of dimension correction amount and correction development condition tables 36; a calculation unit 34 which calculates correction development conditions on the basis of the selected table 36; and a development mechanism 10 which develops a processed substrate under the calculated correction development conditions. |
