发明名称 METHOD OF FABRICATING PATTERNED FUNCTIONAL SUBSTRATES
摘要 Methods of preparing organosilane-functionalized regions on a substrate surface and more specifically fabricating patterned functionalized substrates suitable to be optically read, the methods generally comprising employing a vapor deposition process of an organosilane gas onto a lithographically patterned silicon surface followed by removal of the patterning media in a bath of organic solvents and ultrasonic excitation. The inventive methods provide optimized surface density of functional species while avoiding deleterious effects that can occur when lithographically patterned substrates are exposed to various gaseous species during the functionalization process.
申请公布号 US2013323652(A1) 申请公布日期 2013.12.05
申请号 US201213489099 申请日期 2012.06.05
申请人 FERNANDEZ ANDRES;ROY SHAUNAK;SHAFTO JAY;BURNS NORMAN L.;RICHTER CLAUDIA;INDERMUHLE PIERRE F.;COMPLETE GENOMICS, INC. 发明人 FERNANDEZ ANDRES;ROY SHAUNAK;SHAFTO JAY;BURNS NORMAN L.;RICHTER CLAUDIA;INDERMUHLE PIERRE F.
分类号 G03F7/20;B05D1/00 主分类号 G03F7/20
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