发明名称 GAS BARRIER FILM AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a gas-barrier laminated film that has superior optical characteristics while having enough gas barrier properties and has superior production stability having no variation in various performances in manufacturing.SOLUTION: A gas barrier film has an inorganic layer formed by a vacuum vapor deposition method at least in one side surface of an base material. The inorganic layer formed by the vacuum vapor deposition is formed by setting up vapor deposition material including silicon and silicon monoxide in a crucible whose inner surface of a housing comprises materials not active to the silicon monoxide gas, and evaporating the vapor deposition material by heating.
申请公布号 JP2013233744(A) 申请公布日期 2013.11.21
申请号 JP20120108046 申请日期 2012.05.09
申请人 MITSUBISHI PLASTICS INC 发明人
分类号 B32B9/00;C23C14/10;C23C14/24;C23C16/42 主分类号 B32B9/00
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