COATING AND DEVELOPING DEVICE, COATING AND DEVELOPING METHOD, AND STORING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a technique that can suppress installation area of a processing block and suppress reduction of operation efficiency of a device.SOLUTION: A coating and developing device comprises a mode selector for selecting a feeding mode of a subsequent substrate from modes M1 and M2 on the basis of data stored in a storage unit when abnormality of a substrate is detected in an inspection by an inspection module. The mode M1 is a mode for specifying a module for which a substrate in a unit block for development processing is processed, and controlling operation of a feeding mechanism for the unit block so that a subsequent substrate is fed to a module other than the specified module. The module M2 is a mode for specifying a unit block for the development processing for which a substrate is processed, and controlling operation of a delivery mechanism so that a subsequent substrate is fed to a unit block for the development processing other than the specified unit block for the development processing.