发明名称 FLEXIBLE INTERATED CIRCUIT AND METHOD OF MANUFACTURING THE FLEXIBLE INTERATED CIRCUIT
摘要 The present invention relates to a method of manufacturing a flexible integrated circuit and, more specifically, to a method of manufacturing a flexible integrated circuit comprising a step of forming an LSN thin film layer by depositing the LSN thin film layer on the upper and lower surfaces of a substrate; a step of depositing a polycrystalline silicon thin film layer on the upper part of the LSN thin film layer deposited on the upper surface of the substrate; a step of forming a component part by patterning and etching the polycrystalline silicon thin film layer; a step of forming a via hole by etching the polycrystalline silicon thin film layer at the boundary of the component part and the LSN thin film layer deposited on the upper surface of the substrate; a step of etching the LSN thin film layer deposited on the lower surface of the substrate; a step of forming a protective layer on the upper part; a step of coating a photosensitive film on the upper part to protect the component part from a substrate etching solution; a step of etching the substrate until the lower surface of the LSN thin film layer deposited on the upper surface of the substrate is exposed by soaking the substrate in the substrate etching solution; and a step of removing the photosensitive film.
申请公布号 KR20130125249(A) 申请公布日期 2013.11.18
申请号 KR20120048840 申请日期 2012.05.08
申请人 KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE 发明人 KIM, MIN SEOK;PARK, YON KYU;KIM, JOMG HO;CHOI, IN MOOK;LEE, SUNG JUN;SONG, HAN WOOK;YANG, TAE HEON;BAE, NAM HO;KIM, BYEONG IL
分类号 H01L21/82 主分类号 H01L21/82
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