| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for forming a zinc oxide-based transparent oxide film, by which the transparent oxide film having low refractive index and favorable gas-barrier property can be formed by direct-current sputtering, and target crack or abnormal discharge does not occur.SOLUTION: A sputtering target is composed of the oxide of a composition comprising, with respect to the whole metal component amount, 0.6-8.0 at% of one or both of Al and Ga, 24-33 at% of Si, and the balance Zn with inevitable impurities. The Si exists in the oxide as a Zn-Si composite oxide, or as the Zn-Si composite oxide in a part and amorphous oxide in the balance. |
