| 摘要 |
<p>Provided is a plasma generation device that can generate uniform plasma over a wide range. The plasma generation device (1) is characterized by: two plasma guns that jet ionizing discharge gas and are provided with a cathode (6), which radiates electrons, and a focusing coil (10), which forms magnetic flux that guides the radiated electrons, being disposed facing each other; and the two plasma guns (3) having a mutually opposite orientation of the focusing coil (10) polarity with respect to the cathode (6).</p> |
