发明名称 Integrated decoupling capacitor employing conductive through-substrate vias
摘要 A capacitor in a semiconductor substrate employs a conductive through-substrate via (TSV) as an inner electrode and a columnar doped semiconductor region as an outer electrode. The capacitor provides a large decoupling capacitance in a small area, and does not impact circuit density or a Si3D structural design. Additional conductive TSV's can be provided in the semiconductor substrate to provide electrical connection for power supplies and signal transmission therethrough. The capacitor has a lower inductance than a conventional array of capacitors having comparable capacitance, thereby enabling reduction of high frequency noise in the power supply system of stacked semiconductor chips.
申请公布号 US8558345(B2) 申请公布日期 2013.10.15
申请号 US20090614883 申请日期 2009.11.09
申请人 KIM TAE HONG;SPROGIS EDMUND J.;MCALLISTER MICHAEL F.;SHAPIRO MICHAEL J.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 KIM TAE HONG;SPROGIS EDMUND J.;MCALLISTER MICHAEL F.;SHAPIRO MICHAEL J.
分类号 H01L27/108;H01L21/02;H01L23/04;H01L29/94 主分类号 H01L27/108
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