发明名称 STABLE SURFACE WAVE PLASMA SOURCE
摘要 A surface wave plasma (SWP) source is described. The SWP source comprises an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. The EM wave launcher comprises a slot antenna having at least one slot. The SWP source further comprises a first recess configuration and a second recess configuration formed in the plasma surface, wherein at least one first recess of the first recess configuration differs in size and/or shape from at least one second recess of the second recess configurations. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma.
申请公布号 US2013264938(A1) 申请公布日期 2013.10.10
申请号 US201313830090 申请日期 2013.03.14
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON LIMITED 发明人 CHEN LEE;ZHAO JIANPING;BRAVENEC RONALD V.;FUNK MERRITT
分类号 H05H1/46 主分类号 H05H1/46
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