发明名称 |
STABLE SURFACE WAVE PLASMA SOURCE |
摘要 |
A surface wave plasma (SWP) source is described. The SWP source comprises an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. The EM wave launcher comprises a slot antenna having at least one slot. The SWP source further comprises a first recess configuration and a second recess configuration formed in the plasma surface, wherein at least one first recess of the first recess configuration differs in size and/or shape from at least one second recess of the second recess configurations. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma.
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申请公布号 |
US2013264938(A1) |
申请公布日期 |
2013.10.10 |
申请号 |
US201313830090 |
申请日期 |
2013.03.14 |
申请人 |
TOKYO ELECTRON LIMITED;TOKYO ELECTRON LIMITED |
发明人 |
CHEN LEE;ZHAO JIANPING;BRAVENEC RONALD V.;FUNK MERRITT |
分类号 |
H05H1/46 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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