发明名称 |
METHOD OF MANUFACTURING AN X-RAY DIFFRACTION GRATING MICROSTRUCTURE FOR IMAGING APPARATUS |
摘要 |
<p>A microstructure manufacturing method includes forming a first insulating film on an Si substrate, exposing an Si surface by removing a part of the first insulating film, forming a recessed portion by etching the Si substrate from the exposed Si surface, forming a second insulating film on a sidewall and a bottom of the recessed portion, forming an Si exposed surface by removing at least a part of the second insulating film formed on the bottom of the recessed portion, and filling the recessed portion with a metal from the Si exposed surface by electrolytic plating.</p> |
申请公布号 |
EP2646602(A1) |
申请公布日期 |
2013.10.09 |
申请号 |
EP20110731520 |
申请日期 |
2011.06.10 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
WANG, SHINAN;NAKAMURA, TAKASHI;TESHIMA, TAKAYUKI;SETOMOTO, YUTAKA;WATANABE, SHINICHIRO |
分类号 |
C25D5/02;C25D7/00;C25D7/12;G21K1/06;H01L21/768 |
主分类号 |
C25D5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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