发明名称 System and method for cleaning a conditioning device
摘要 A system for cleaning a conditioning device to improve the efficiency of the conditioning of a polishing pad using the conditioning device as part of a chemical-mechanical polishing process, the system comprising a conditioning device; a fluid dispenser arranged to dispense a fluid on the conditioning device; and an acoustic nozzle arranged to emit a megasonic or ultrasonic signal at the conditioning device while the fluid dispenser is dispensing the fluid on the conditioning device.
申请公布号 US8545634(B2) 申请公布日期 2013.10.01
申请号 US20080090186 申请日期 2008.04.14
申请人 LAFON JEAN-MARC;DELMONACO SILVIO;PETITDIDIER SEBASTIEN;FREESCALE SEMICONDUCTOR, INC.;STMICROELECTRONICS SRL;STMICROELECTRONICS (CROLLES 2) SAS 发明人 LAFON JEAN-MARC;DELMONACO SILVIO;PETITDIDIER SEBASTIEN
分类号 B08B3/12;B24B53/017 主分类号 B08B3/12
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