发明名称 |
System and method for cleaning a conditioning device |
摘要 |
A system for cleaning a conditioning device to improve the efficiency of the conditioning of a polishing pad using the conditioning device as part of a chemical-mechanical polishing process, the system comprising a conditioning device; a fluid dispenser arranged to dispense a fluid on the conditioning device; and an acoustic nozzle arranged to emit a megasonic or ultrasonic signal at the conditioning device while the fluid dispenser is dispensing the fluid on the conditioning device.
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申请公布号 |
US8545634(B2) |
申请公布日期 |
2013.10.01 |
申请号 |
US20080090186 |
申请日期 |
2008.04.14 |
申请人 |
LAFON JEAN-MARC;DELMONACO SILVIO;PETITDIDIER SEBASTIEN;FREESCALE SEMICONDUCTOR, INC.;STMICROELECTRONICS SRL;STMICROELECTRONICS (CROLLES 2) SAS |
发明人 |
LAFON JEAN-MARC;DELMONACO SILVIO;PETITDIDIER SEBASTIEN |
分类号 |
B08B3/12;B24B53/017 |
主分类号 |
B08B3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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