发明名称 |
FOCUSED ION BEAM DEVICE AND ADJUSTING METHOD FOR ION BEAM OPTICAL SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To provide a focused ion beam device capable of easily and precisely setting a focusing voltage.SOLUTION: A control terminal records calculated values of focusing voltages with which reference beam currents Athrough Aare obtained for all apertures #1 through #5 in a focusing voltage table in advance. The control terminal obtains an experimental value of the focusing voltage with which the reference beam current Ais obtained for the reference aperture #1. The control terminal obtains a correction value for the focusing voltage by subtracting the recorded calculated value for the reference aperture #1 from the experimental value. The control terminal obtains set values of the focusing voltages by adding respective correction values to the calculated values recorded for all the apertures #1 through #5, and records the resulting values in the focusing voltage table. |
申请公布号 |
JP2013196862(A) |
申请公布日期 |
2013.09.30 |
申请号 |
JP20120060961 |
申请日期 |
2012.03.16 |
申请人 |
HITACHI HIGH-TECH SCIENCE CORP |
发明人 |
SUGIYAMA YASUHIKO;ASAHATA TATSUYA;DOI TOSHIO;OBA HIROSHI |
分类号 |
H01J37/317;H01J37/12 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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