发明名称 FOCUSED ION BEAM DEVICE AND ADJUSTING METHOD FOR ION BEAM OPTICAL SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a focused ion beam device capable of easily and precisely setting a focusing voltage.SOLUTION: A control terminal records calculated values of focusing voltages with which reference beam currents Athrough Aare obtained for all apertures #1 through #5 in a focusing voltage table in advance. The control terminal obtains an experimental value of the focusing voltage with which the reference beam current Ais obtained for the reference aperture #1. The control terminal obtains a correction value for the focusing voltage by subtracting the recorded calculated value for the reference aperture #1 from the experimental value. The control terminal obtains set values of the focusing voltages by adding respective correction values to the calculated values recorded for all the apertures #1 through #5, and records the resulting values in the focusing voltage table.
申请公布号 JP2013196862(A) 申请公布日期 2013.09.30
申请号 JP20120060961 申请日期 2012.03.16
申请人 HITACHI HIGH-TECH SCIENCE CORP 发明人 SUGIYAMA YASUHIKO;ASAHATA TATSUYA;DOI TOSHIO;OBA HIROSHI
分类号 H01J37/317;H01J37/12 主分类号 H01J37/317
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