发明名称 EXCIMER LIGHT IRRADIATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a structure in which stress concentration is prevented from occurring in one point of a discharge container by regulating warpage of the discharge container at two points by a movement regulation member with respect to the warpage of the discharge container, in an excimer light irradiation device composed of excimer lamps each having an ultraviolet reflection film on the inner face of the non-light emission side of the discharge container held in a housing, and a movement regulation member which regulates the warpage of the discharge container to the ultraviolet reflection film side by being abutted on the surface of the ultraviolet reflection film side of the discharge container and has rotary rollers rotatable in the longitudinal direction of the discharge container.SOLUTION: A movement regulation member includes bifurcated legs to hold rotary rollers at the tip thereof and is supported in an intermediate part of the legs so as to be swingable in the rotation direction of the rotary rollers.
申请公布号 JP2013191398(A) 申请公布日期 2013.09.26
申请号 JP20120056637 申请日期 2012.03.14
申请人 USHIO INC 发明人 ENDO SHINICHI
分类号 H01J65/00 主分类号 H01J65/00
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