发明名称 |
NONVOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a nonvolatile memory device which can realize fast operating speed in all of a cell array region and a peripheral circuit region.SOLUTION: A nonvolatile memory device includes: a substrate 1; a memory gate pattern MG1 and a non-memory gate pattern NG1 which are disposed on the substrate 1 and separated from each other, where the non-memory gate pattern NG1 includes an ohmic layer, and the memory gate pattern MG1 does not include an ohmic layer 8. In this device, the memory gate pattern MG1 does not include an ohmic layer, but the non-memory gate pattern NG1 includes an ohmic layer 8. |
申请公布号 |
JP2013183158(A) |
申请公布日期 |
2013.09.12 |
申请号 |
JP20130035981 |
申请日期 |
2013.02.26 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
LIM TAI SOO;YUN KIHYUN;LEE JEONGGIL;RIN GENSHAKU;HAN HAUK;LEE MYUNG BUM |
分类号 |
H01L21/8247;H01L21/336;H01L27/10;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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