发明名称 NONVOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory device which can realize fast operating speed in all of a cell array region and a peripheral circuit region.SOLUTION: A nonvolatile memory device includes: a substrate 1; a memory gate pattern MG1 and a non-memory gate pattern NG1 which are disposed on the substrate 1 and separated from each other, where the non-memory gate pattern NG1 includes an ohmic layer, and the memory gate pattern MG1 does not include an ohmic layer 8. In this device, the memory gate pattern MG1 does not include an ohmic layer, but the non-memory gate pattern NG1 includes an ohmic layer 8.
申请公布号 JP2013183158(A) 申请公布日期 2013.09.12
申请号 JP20130035981 申请日期 2013.02.26
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 LIM TAI SOO;YUN KIHYUN;LEE JEONGGIL;RIN GENSHAKU;HAN HAUK;LEE MYUNG BUM
分类号 H01L21/8247;H01L21/336;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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