CHARGED PARTICLE BEAM DEVICE, AND OPERATION CONDITION SETTING DEVICE OF CHARGED PARTICLE BEAM DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an electronic microscope device for improving the throughput of the device by accurately detecting a desired measurement pattern without detecting an addressing pattern in each time in the case of measuring an arbitrary position of a plurality of samples having the same shape, and a dimension measurement method in the device.SOLUTION: In the case of measuring an arbitrary position of a plurality of samples having the same shape, the measurement of a first sample is accurately subjected to visual field movement to a measurement pattern by using an addressing pattern. When detecting the addressing pattern and the measurement pattern at this time, a visual field deviation amount between targeted coordinates and actual coordinates is calculated, and the visual field deviation amount is reflected on targeted coordinates while measuring a pattern of the same coordinates when measuring the next sample.