FILM FORMATION APPARATUS AND FILM FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a film formation apparatus capable of forming a vapor-deposited film to cover a deposition target object having a three-dimensional curved surface, and to provide a film formation method of a vapor-deposited film to cover a three-dimensional curved surface.SOLUTION: A film formation apparatus is equipped with: a vapor deposition source having a directivity in deposition direction; a vapor deposition source moving mechanism which moves the vapor deposition source; a deposition target object holding mechanism which holds a deposition target object having a three-dimensional curved surface; a deposition direction changing mechanism which changes the deposition direction; and a control part which controls the vapor deposition source moving mechanism and the deposition direction changing mechanism.