POLYMERIZABLE TERTIARY ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

摘要

PURPOSE: A polymerizable tertiary ester compound is provided to be useful as a monomer for the base resin of a resist material with reduced pattern edge roughness and high resolution, in a photolithography using high energy rays. CONSTITUTION: A polymerizable tertiary ester compound is represented by chemical formula 1a or 1b. A resist material is a base resin, contains the polymer compound, and contains one or more of an inorganic solvent and an acid generator. A pattern-forming method includes a process spreading the resist material on a substrate; a process exposing the spread resist material through a photomask by using high energy rays or electronic rays after a heat treatment; and a process developing the exposed resist material by using a developer solution.