发明名称 SUBSTRATE PEELING DEVICE AND SUBSTRATE PEELING METHOD
摘要 PROBLEM TO BE SOLVED: To reliably peel an epitaxy substrate after a buffer layer is irradiated with a laser beam from a rear side of the epitaxy substrate and is destroyed.SOLUTION: A laser processing device 1 comprises: a chuck table 3 that holds a transfer substrate side of a composite substrate; holding means 8 that faces the chuck table 3 and holds a side of the epitaxy substrate in the composite substrate, in which a through hole that reaches the buffer layer is formed; and transfer means 83 that relatively moves the chuck table 3 and the holding means 8 in such a direction as to come close to and depart from each other.
申请公布号 JP2013143508(A) 申请公布日期 2013.07.22
申请号 JP20120003574 申请日期 2012.01.11
申请人 DISCO ABRASIVE SYST LTD 发明人 IIZUKA KENTARO
分类号 H01L21/02;H01L21/683;H01L33/00;H01S5/02 主分类号 H01L21/02
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