发明名称 PHOTOELECTRIC CONVERSION ELEMENT AND MANUFACTURING METHOD OF THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photoelectric conversion element which can improve insulation properties. <P>SOLUTION: A photoelectric conversion element 100 comprises: an n-type single crystal silicon substrate 1; a passivation film 2; p-type amorphous films 11-1m; n-type amorphous films 21-2m-1; semiconductor thin films 31-3n; and electrodes 41-4m, 51-5m. The p-type amorphous films 11-1m and the n-type amorphous films 21-2m-1 are alternately arranged in an in-plane direction with contacting a rear face of the n-type single crystal silicon substrate 1. The semiconductor thin films 31-3n contact the p-type amorphous films 11-1m and the n-type amorphous films 21-2m-1 and arranged between the p-type amorphous films 11-1m and the n-type amorphous films 21-2m-1. The electrodes 41-4m are arranged to contact the p-type amorphous films 11-1m, respectively, and the electrodes 51-5m -1 are arranged to contact the n-type amorphous films 21-2m-1, respectively. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013125891(A) 申请公布日期 2013.06.24
申请号 JP20110274370 申请日期 2011.12.15
申请人 SHARP CORP 发明人 NAKAMURA JUNICHI
分类号 H01L31/04 主分类号 H01L31/04
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