RADIATION DETECTOR AND MANUFACTURING METHOD THEREFOR

摘要

An FPD (1), wherein a semiconductor polycrystalline film (2) is formed directly on a surface (5a) of a graphite support substrate (4), the surface having a surface roughness (Ra) of 0.5-1.5 mum inclusive. Consequently, crystalline nuclei which become the origins of crystalline grains that are initially formed can be easily formed on the support substrate (5) side (the surface (5a) of the support substrate (5)), and thus the crystalline grains that are initially formed can be made small without growing large. Therefore, large crystalline grains can be formed with time from the small crystalline grains that are initially formed. Moreover, since the small crystalline grains are initially formed on the support substrate (5) side, the adhesion of the semiconductor polycrystalline film (2) to the support substrate (5) side can be improved. The irregularities in the surface of the semiconductor polycrystalline film (2) can be suppressed.