| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a nanoimprint lithography apparatus capable of correcting the partial error and the scale error of a stamp and a substrate. <P>SOLUTION: A stamp 130 having a pattern to be imprinted on a substrate is provided with a plurality of posts 202 on the surface opposite from the patterned surface. The posts 202 are connected with an actuator 204. When the actuator 204 is driven, the interval between the adjoining posts 202 changes, and the stamp 130 is deformed. Consequently, the partial error where a part of the stamp 130 does not match the corresponding part of the substrate in the size or the shape, and the scale error where the stamp 130 does not match the substrate in the size can be corrected. <P>COPYRIGHT: (C)2013,JPO&INPIT |
