| 摘要 |
<P>PROBLEM TO BE SOLVED: To adjust the positions of two substrates with high accuracy even when both alignment marks respectively formed in the two substrates cannot be simultaneously focused on. <P>SOLUTION: An alignment mark AM1 formed on a substrate to which a pattern is transferred is formed by arranging alignment patterns AP101 to AP109, and AP111 to AP114 being a square solid figure. On the other hand, on a bracket supporting patterns to be transferred to a substrate, an annular hollow rectangular alignment pattern AP2 is made of the same material as the pattern, as an alignment mark AM2. The alignment mark AM1 is composed of patterns including low spatial frequency components more than the alignment mark AP2 does. A center-of-gravity position can be detected with high accuracy even when the alignment mark AM1 is imaged out of focus. <P>COPYRIGHT: (C)2013,JPO&INPIT |
