发明名称 GALLIUM NITRIDE GROWTH METHOD ON SILICON SUBSTRATE
摘要 A semiconductor structure includes a silicon substrate; more than one bulk layer of group-III/group-V (III-V) compound semiconductor atop the silicon substrate; and each bulk layer of the group III-V compound is separated by an interlayer.
申请公布号 US2013140525(A1) 申请公布日期 2013.06.06
申请号 US201113308997 申请日期 2011.12.01
申请人 CHEN CHI-MING;LIU PO-CHUN;LIN HUNG-TA;YU CHUNG-YI;TSAI CHIA-SHIUNG;HWANG HO-YUNG DAVID;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHEN CHI-MING;LIU PO-CHUN;LIN HUNG-TA;YU CHUNG-YI;TSAI CHIA-SHIUNG;HWANG HO-YUNG DAVID
分类号 H01L29/205;H01L21/20 主分类号 H01L29/205
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