EVALUATION OF ETCH MASK FILM

摘要

PURPOSE: A method for evaluating an etching mask layer is provided to obtain the etching mask layer with high etching performance by evaluating an etching resistance in etching a pattern forming layer and an etchability in etching the etch mask layer. CONSTITUTION: A chamber(1) provides a processing space and receives a substrate(5). A first radio frequency power source is connected to a bottom electrode(3). A second radio frequency power source is connected to an antenna coil(4). A ground(2) maintains the potential of the chamber with 0 by connecting the chamber to the ground.