| 发明名称 |
CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN |
| 摘要 |
This cyclic compound has a molecular weight of 500-5000 and is represented by formula (1). |
| 申请公布号 |
WO2013073582(A1) |
申请公布日期 |
2013.05.23 |
| 申请号 |
WO2012JP79528 |
申请日期 |
2012.11.14 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
ECHIGO, MASATOSHI;YAMAKAWA, MASAKO |
| 分类号 |
C07C69/54;C07C67/14;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C07C69/54 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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